Equipment & Training Schedule

Equipment List

Technical Contacts

Gehoski, Kathleen

Research and Development Engineer

Technical Lead

kag31@psu.edu
814-865-7443

N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
kag31

Eichfeld, Chad

Nanofab Director of Operations

Nanolithography Engineer

cme133@psu.edu
814-865-8976

N-153 Millennium Science Complex
University Park, PA 16801

PSU UserID: 
cme133

Labella, Michael

Litho Process Engineer

mil102@psu.edu
814-863-4339

N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
mil102

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Lithography

Lithography

Contact Print Lithography

Contact lithography exposes an entire substrate at once while the mask is in contact with the substrate. It is generally good for features down to about one micron and one micron overlay, but most people switch to the stepper for ease of achieving the smaller dimensions and tighter overlay. The Nanofab has two contact lithography tools, the EVG 620 and the Karl Suss MA/BA6, to satisfy demand for this basic lithography method. The Nanofab has the ability to make the contact masks as well.

Karl Suss MABA6

  • Semi-Automatic operation
  • Double objective optical microscope
  • Wafer sizes from pieces to 6 inch
  • Unfiltered Hg lamp exposure 8 mW/cm2 @ 365 nm Hg I-line
  • Top and Bottom side optical alignment
  • Mask sizes of 4, 5, and 7 inches
  • Vacuum, hard, proximity, and soft contact modes

Resolution 1 µm, Overlay 1 µm