New IBE QuaZar System: The newly installed PlasmaTherm IBE system will bring enhanced etching capabilities to the MRI Nanofab. The system is an Ion Beam Etch system which uses an Ar plasma to etch material. The system allows for the control of the feature profile and etch uniformity across a 200 mm substrate using advanced stage tilt and rotation during the etching process. In addition, the process can eliminate the redeposition of etched material on the sidewall of the features, thus eliminating the “fencing” effect that is common when etching nonvolatile materials, when using the more conventional plasma etch processes. Read more ⇒
New Heidelberg MLA 150 Direct Write Exposure Tool: The Nanofab is excited to announce a new lithography exposure tool. The MLA 150 is a non-contact, high speed, direct write lithography tool. It can expose patterns directly without prior fabrication of a mask resulting in significantly shorter prototyping cycles. It offers topside alignment and backside alignment with high accuracy, and a 405 nm wavelength light source which generates sufficient dose to expose thick and less sensitive resists. The sample size range allowed on the MLA 150 are 5 mm X 5 mm to 150 mm X 150 mm with substrate thickness range from 100 µm to 6 mm. The MLA 150 provides for flexible change of pattern, distortion compensation and other software corrections. The unique Draw-Mode allows the user to use the overhead camera to directly draw structures on the image, then directly write the structures. Read more ⇒