Exposes patterns directly without prior fabrication of a mask resulting in significantly shorter prototyping cycles. The MLA 150 provides for flexible change of pattern, distortion compensation and other software corrections. The unique Draw-Mode allows the user to use the overhead camera to directly draw structures on the image, then directly write the structures.
This laser-writer is a high-resolution pattern generator for mask making and direct writing on any flat surface coated with photoresist. The most recent upgrade adds Grey Scale patterning. Both Laser-writers can print down to 800 nm with overlay accuracy of 500 nm.
The laser-writer is a High Resolution pattern generator (PG) for mask making and direct writing on any flat surface coated with photoresist. A digital pattern file, created by the user with Computer Aided Design (CAD) software, direct the laser to areas on the substrate to expose the photoresist. This technique is often referred to as "maskless or direct write" lithography.
Electron beam lithography can achieve feature sizes of less than 10 nm.
It is a maskless or direct write technique that requires input of a CAD file.
This model has a unique Z-axis stage that adjusts to accommodate curved surfaces.