Equipment & Training Schedule

Equipment List

Technical Contacts

Gehoski, Kathleen

Research and Development Engineer

Technical Lead

kag31@psu.edu
814-865-7443

N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
kag31

Eichfeld, Chad

Research and Development Engineer

cme133@psu.edu
814-865-8976

N-153 Millennium Science Complex
University Park, PA 16801

PSU UserID: 
cme133

Labella, Michael

Litho Process Engineer

mil102@psu.edu
814-863-4339

N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
mil102

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Lithography

Lithography

Lithography Software

Tanner EDA L-Edit

The backend design of this software combines the fastest rendering available wtih powerful features that exceed the need of the most demanding users. You can draw, quickly edit, and use less keystrokes for creating MEMS, sensors, or mixed signal ICs.

View the L-Edit Data Sheet from Tanner EDA

Pattern data used for electron beam lithography is prepared using a software package called BEAMER by GenISys. This software allows for both simple or complex pattern preparation flows. It has a very easy to use GUI interface that allows for ultimate flexibility. Proximity effect correction (PEC) is done within this software package. There is also an advanced modeling software package that allows for simulation of exposures before exposing a real sample.

Electron Beam Lithography doesn’t have to be “slow”. We are experts at optimizing the balance between writetime and pattern quality. The Raith EBPG5200ES has the ability to create custom shapes called sequences that can greatly reduce write times while improving the quality of the write. Beamer has this technology fully integrated and is the workbench we use to adjust the parameters of the pattern fracture combined with exposure tool settings.