Equipment & Training Schedule

Equipment List

Technical Contacts

Drawl, William

Research and Development Engineer

wrd1@psu.edu
814-863-8558

N105 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
wrd1

Jones, Beth

Research and Development Engineer

baj2@psu.edu
1-814-863-1694

N104 Millennium Science Complex University Park, PA 16802

PSU UserID: 
baj2

Liu, Bangzhi

Research Associate

bul2@psu.edu
814-863-0964

N154 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
bul2

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Deposition and Growth

Deposition and Growth

Thermal Oxidation

Thermal oxidation is a process for reacting gases (Oxygen in dry oxidation, water vapor in wet oxidation) with solid silicon substrates at high temperature ( 800- 1200C) in which the silicon substrate atoms are converted to silicon dioxide (SiO2).

Oxidation Processes

  • Ultrapure oxidation of silicon wafers can be accomplished in the Thermco oxidation furnace and offers high quality "dry" and wet oxidation processes. Samples are restricted to those without any metals.
  • Oxidation of silicon can also be carried out using the MRL (Black Max) system on substrates that have metals.

Equipment/Systems