Deposition & Growth
Sol-Gel (chemical solution deposition) Deposition and Growth in the PZT Bay
- Two spin bench stations
- Four hot plates, including a vacuum hot plate
- Two rapid thermal annealers (RTAs): A 6 inch lead-free RTA and an 8 inch RTA for Pb-based compositions
The PZT Bay is designed for chemical solution deposition in a low humidity controlled environment to ensure reproducible high quality thin films. The stations include 2 Brewer spin benches for depositing the solution and high temperature hot plates for solvent removal and pyrolysis prior to crystallization. The 2 RTAs are used to crystallize the resulting films. Both are dedicated tools so as to keep contamination to a minimum.
A wide variety of film compositions, e.g. doped or undoped PbZr1-xTixO3 (PZT), LaNiO3, BiFeO3, BaTiO3, K1-xNaxNbO3, PbMg1/3Nb2/3O3-PbTiO3, and bismuth zinc niobite have been deposited. We are happy to consider other compositions upon request.
Substrates include platinized silicon oxide wafers, SOI wafers, SrTiO3, glass wafers and flexible metal foils, e.g. nickel and stainless steel.
To get started and become a user, please contact Jaime Reish (email@example.com) 814-865-7348.