Join Our Webinar:
Next‑Generation Coatings for Manufacturing: Exploring Atomic Layer Deposition (ALD)
Accelerating ALD Innovation through Penn State’s Integrated Research Ecosystem
DATE: February 11, 2026
TIME: 1:00 p.m. - 2:00 p.m. ET
FESEM revealing microstructure and excellent conformal coverage of ALD film on planar (b) and high aspect ratio structure (c).
PRESENTERS:
Atomic Layer Deposition (ALD) is emerging as a go‑to solution for companies seeking ultra-thin, uniform, and highly engineered coatings. Its ability to deliver atomically precise, pinhole‑free films opens new opportunities for performance, reliability, and competitive differentiation across industrial markets.
This webinar will introduce the core principles of ALD and showcase how the technology enables controlled film growth with unmatched accuracy in thickness, composition, and conformity—even on complex 3D surfaces. Attendees will see how ALD is being adopted across a wide range of applications, including:
- Sensors & optical systems
- Quantum and microelectronic applications
- Biomedical and wearable devices
- Energy storage, catalysis, and hydrogen technologies
- Moisture, oxygen, and corrosion‑resistant barrier coatings
You’ll also learn how Penn State’s Materials Research Institute (MRI) provides a complete ecosystem for ALD development—from process design and prototype coatings to advanced characterization tools such as XPS, SEM, TEM and ellipsometry.
The session will feature insights from the Kurt J. Lesker Company, highlighting how they help industry transition ALD processes from lab‑scale discovery to full production environments.
Each year, more than 100 companies partner with MRI to accelerate innovation and solve real‑world manufacturing challenges. Join this webinar to learn how you can collaborate with Penn State MRI and unlock new ALD solutions for your products and processes.
