MCL now offers a range of analytical techniques that can be used to determine important electronic properties of your device or material system. These properties include: band gap (Eg), work function (WF), valence band maximum (VBM), ionization energy (IE), electron affinity (EA), conduction band minimum (CBM) and carrier concentration. We have techniques for studying electronic defect states in the band gap which can impact device performance and for those making heterojunctions we can determine valence and conduction band offsets. This talk will provide an overview of these parameters and how they can be measured within MCL along with details about sample requirements and limitations.