Eichfeld, Chad

Nanofab Director of Operations
Nanolithography Engineer
N-153 Millennium Science Complex
University Park, PA 16801
The Vistec EBPG5200 system is used to directly write fine nanometer features in resist. Features as small as 14nm have been achieved. The system has a custom stage with 10mm of Z-height travel for writing curved surfaces as well as parts with extreme topography. The system can handle small parts through 100mm (4 inch) wafers and 5" x 5" mask plates.
The Vistec has been paired with the data (pattern) preparation software Layout Beamer which is easy to use as well as having advanced features such as proximity effect correction.
Litho: EBPG 5200 Vistec e-beam (MSC)