Research and Development Engineer
N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802
Lithography on curved samples and samples with very tall or deep features is a new area of development being undertaken by Penn State which opens up new possibilities in areas of optics, meta-materials and even electronics. It is comprised of three major components.
The typical spin casting of resist does not work well on curved surfaces so a special mist deposition tool has been acquired. It can controllably and reliably atomize and apply resist to curved surfaces.
A specialized tool is used to map the curved surface at high resolution. The data is fed into the exposure tool.