Equipment

The Nanofab provides specialized instruments and technical support in areas that mirror our faculty research strengths, including sputter deposition, atomic layer deposition, thin film piezoelectronics, 2D materials, CMOS, and MEMS. Technical capabilities that set the Nanofab apart include e-beam lithography of fine spatial scale on curved surfaces, and the ability to integrate nontraditional electronic materials such as complex oxides, chalcogenides, graphene, etc. into complex structures. The Nanofab is open to novel/unusual materials and techniques.

Deposition & Growth

Lithography

Etching

Characterization

 

Located in the Millennium Science Complex, the Nanofab provides faculty, students, and industry researchers access to sophisticated instruments for micro-and nanofabrication. The Nanofab’s 10,000-square-foot state-of-the-art cleanroom is supported by 6,000 square feet of space for utilities in the subfab. The Penn State Nanofab offers expertise in “top-down” (e.g. deposition, etching) and “bottom up” (e.g. self- assembling films) nanofabrication. The technical staff provides extensive support and training or can perform research on behalf of industry partners. More than 65 materials can be deposited and 70+ materials can be dry etched in the suite of tools resident in the facility.