Equipment & Training Schedule

Equipment List

Technical Contacts

Gehoski, Kathleen

Research and Development Engineer

Technical Lead

kag31@psu.edu
814-865-7443

N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
kag31

Eichfeld, Chad

Nanofab Director of Operations

Nanolithography Engineer

cme133@psu.edu
814-865-8976

N-153 Millennium Science Complex
University Park, PA 16801

PSU UserID: 
cme133

Labella, Michael

Litho Process Engineer

mil102@psu.edu
814-863-4339

N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
mil102

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Lithography

Lithography

Projection/Stepper Lithography

A stepper is a type of projection lithography that can rapidly repeat or step a pattern across a substrate. It has optics that reduce the image on the mask, called a reticle, when it is projected onto the substrate. The Penn State Nanofab has two I-line (365 nm light) 5X reduction GCA steppers, the GCA 8000 and the more capable GCA8500. The best resolution is about 400 nm features and an overlay of 150 nm across a 14 mm x 14 mm maximum field size. Reticles can be made in the facility as well.

Equipment Specifications

 

GCA 8000

GCA 8500

Lens Tropen 1635i Tropen 2145
Resolution (prod./research 850 nm/600 nm 650 nm/400 nm
NA 0.35 0.45
Depth of Focus 1.49 µm ~1.25 µm
Demagnification 5X 5X
Wavelength i-line (365 nm) i-line (365 nm
Field Size 11.3 mm by 11.3 mm 14 mm by 14 mm
Reticles 5" QRTZ (0.090" THK) 5" QRTZ (0.090" THK)
Global Alignment 250 nm 250 nm
Local Alignment 150 nm 150 nm
Sample Size 10 mm to 150 mm 10 mm 150 mm
Autoloader 75 mm wafers 150 mm wafers
Alignment Baseline Manual Automatic
Focus Baseline Manual Automatic
100 mm Backside Capability Yes (with adapter) Yes

Equipment/Systems