Research and Development Engineer
N106 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802
Electron beam lithography can achieve the smallest features at ~10nm. It is a maskless technique that, like the laser writer, has as its input a CAD file and can write the pattern directly on the substrate. The electron beam of Penn State's Vistec 5200 is variable with a minimum of 2nm which is why such small features can be exposed.
The Vistec 5200 at Penn State has a specialized stage that allows it to expose substrates with extreme topography and curved surfaces.