Equipment & Training Schedule

Equipment List

Technical Contacts

Lavallee, Guy

Etch Technical Lead

gpl107@psu.edu
814-865-9339

N105 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
gpl107

Fitzgerald, Andrew

Engeering Support Specialist

amf24
814-867-2657

N153 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
amf24

Miller, Shane

Process Engineer

spm145@psu.edu
814-865-3300

N154 MILLENNIUM SCI COMPLEX
UNIVERSITY PARK, PA 16802

PSU UserID: 
spm145

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Etching

Etching

Dry Etching

Dry etching is a technique of transferring a pattern into a material using reactive gases. Typically this process involves generating a plasma in a process reactor using RF energy to ionize the reactive gases. Plasmas are very complex and have numerous different reactions happening in the plasma simultaneously. These reactions form ions, neutrals, and radicals in the plasma that are then accelerated to the surface of the material by an electric field. The electric field is formed between the plasma and the material to be etched. Dry etching is a more complex technique that may or may not have good selectivity between different materials which can be a drawback. However, the major advantage is that dry etching is typically very anisotropic in nature which allows for very reproducible etch characteristics.

Equipment/Systems

  • Alcatel Speeder 100Si
  • Alcatel Speeder 100SiO2
  • Plasma-Therm 720
  • Plasma-Therm Versalock
  • Ulvac NE-550

See Details, Contacts, & Training Dates