Sol-Gel

Equipment

Sol-Gel (chemical solution deposition) Deposition and Growth in the PZT Bay

Tools

• Two spin bench stations
• Four hot plates, including a vacuum hot plate
• Two rapid thermal annealers (RTAs): A 6 inch lead-free RTA and an 8 inch RTA for Pb-based compositions

Design

The PZT Bay is designed for chemical solution deposition in a low humidity controlled environment to ensure reproducible high quality thin films. The stations include 2 Brewer spin benches for depositing the solution and high temperature hot plates for solvent removal and pyrolysis prior to crystallization. The 2 RTAs are used to crystallize the resulting films.  Both are dedicated tools so as to keep contamination to a minimum.

Capabilities

A wide variety of film compositions, e.g. doped or undoped PbZr_1-xTi_xO₃ (PZT), LaNiO₃, BiFeO₃, BaTiO₃, K_1-xNa_xNbO₃, PbMg_1/3Nb_2/3O₃-PbTiO₃, and bismuth zinc niobite have been deposited. We are happy to consider other compositions upon request.

Substrates include platinized silicon oxide wafers, SOI wafers, SrTiO₃, glass wafers and flexible metal foils, e.g. nickel and stainless steel.

To get started and become a user, please contact Jaime Reish (jdr15@psu.edu) 814-865-7348.