Focused Ion Beam (FIB)

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Focused Ion Beam (FIB)

The focused ion beam (FIB) is an extension to a scanning electron microscope (SEM). With it one can image and modify a specimen with high spatial resolution.

Modifications include site-specific:
  • Material removal
  • Material deposition
  • Particle manipulation
 
How does it work?
  1. A beam of ions hits a sample and causes local sputtering, removing material in a controlled way.
  2. If a special deposition gas is introduced, it is decomposed on the surface and site-specific deposition occurs.

These instruments also include SEM columns for simultaneous imaging during ion beam modification; and, a manipulator for moving small particles.

Technique Advantages
  • site selective sample preparation
  • simultaneous scanning electron microscopy
  • fabrication of complex features via combination of site specific sputtering and C, Pt and W deposition
Typical Applications
  • rapid TEM sample preparation
  • site specific TEM sample preparation
  • electron microscopy of hydrated/biological specimens without fixation
  • evaluation of beam-sensitive materials
  • 3D tomography
  • MEMS fabrication
  • MEMS fabrication
  • EDS
  • EBSD
  • Cryo-SEM and FIB

FEI FIB Instrumentation

1. Quanta 200 3D Dual Beam FIB
2. Helios NanoLab 660

Quanta 3D simplified operating procedure