NNIN at Penn State Facilities / Equipment
The Penn State University Nanofabrication Facility is an established open-access user laboratory that is comprised of approximately 6000 square feet of clean room space and over 3000 square feet of supporting non-clean laboratory space. It includes a wide range of processing and characterization equipment that enables fabrication of electrical, optical, and micromechanical devices to support fundamental and applied research in diverse fields spanning electronics to medicine.
The primary focus of the PSU facility within the NNIN is to provide access to specialized instruments and technical assistance in the areas of complex ferroelectric oxide device micro- and nanofabrication and chemical and molecular-scale nanotechnology.
Penn State has integrated facilities/capabilities in the following categories:
tours of the facilities are available upon request
please click below to see the tour information section
Lithography Equipment
- Leica EBPG5-HR E-Beam Writer*
- GCA 8000 i-line Stepper*
- Heidelberg DWL66 Laser Writer*
- Karl Suss MA/BA6 Contact Aligner with backside Alignment
- Karl Suss MJB3 Contact Aligners
- Resist Processing Stations
Thin Film Deposition Equipment
- Semicore Electron-beam Evaporator
- Kurt Lesker Thermal and Electron-beam Evaporator
- Kurt Lesker CMS-18 DC/RF Sputtering Systems
- FEI Dual Beam Focusing Ion Beam
- Chemical Solution Deposition Station for complex ferroelectric oxides
- MRL 3 Stack LPCVD Furnace System
- Applied Materials P-5000 PECVD Cluster Tool
- Trion Technologies HDP ICP PECVD
- Cambridge Savannah™ 200 Atomic Layer Deposition
- Electroplating System capable of plating copper and gold
Plasma Etching Equipment
- Technics Micro Reactive Ion Etch
- PlasmaTherm 720
- Trion Technologies ICP Reactive Ion Etch
- Applied Materials DPS for complex ferroelectric oxide etching
- Applied Materials MERIE Dielectric Etch
- Alcatel Deep Silicon Reactive Ion Etch
- Xactix XeF2 Etcher
- Tegal 6500 HRe Cluster Etch System for complex ferroelectric oxide etching
- Veeco Ion Mill
Thermal Processing Equipment
- Bruce 4 Stack Atmospheric Oxidation Furnace
- MRL (Black Max) Annealing Furnace
- Modular Processes Technology 600/610 Rapid Thermal Processing Tools
Chemical Nanofabrication & Characterization Equipment
- Molecular Imprints Imprio 55 Nanoimprinter
- Gloves Boxes for SAM Deposition and Chemical Solution Synthesis
- Soft Lithography processing bench
- Spec Coatings Parylene Thermal Evaporator
- Witec NSOM and confocal Raman
- Omicron NSOM and AFM
- Digital Instruments Atomic Force Microscopes
- JEOL 4500 AFM and STM
- Bruker Fourier Transform Infrared Spectrometer & Imaging Microscope
- Physical Electronics 670 Field Emission Auger Electron Spectroscopy
- Kratos Analytical Axis Ultra X-ray Photoelectron Spectroscopy
- Philips PRO MRD 4-circle high-resolution X-ray Diffraction System
- Wet Chemical Processing
Characterization Equipment
- Leitz Optical Microscopes
- Quanta 200 Environmental SEM with EDS
- JEOL 6700F FE-SEM with EDS
- LEO 1530 FE-SEM
- Micromanipulator 6000 Probe Station and Agilent C-V/I-V Test Equipment
- Gaertner Ellipsometer
- Nanospec Ellipsometer
- J. A. Woollam VASE Spectroscopic Ellipsometer
- Tencor 500 Profilometers
- Wyko NT110 Optical Profilometer
- Tencor Surfscan 4500 Surface Particle Inspection Analyzer
- Tencor Flexis 2320
- Four Point Probe
- Witec AFM
Additional PSU Facilities Available to Users of NNIN
NNIN staff will coordinate access to the professionally-staffed Materials Characterization Laboratory (MCL) and Center for Nanoscale Science (CNS) Shared Use Laboratory for remote and on-site access to additional materials and electrical characterization facilities.
MCL Resources:
- JEOL 2010 LaB6 TEM with EELS and EDS
- JEOL 2010F Field Emission TEM/STEM with EELS and EDS
- Philips 420, Tungsten-based 120 keV TEM
- CAMECA IMS 3f Secondary Ion Mass Spectrometry
- Finnigan MAT ICP Mass Spectrometry (high resolution with laser ablation)
- Leeman Labs PS3000UV ICP Atomic Emission
- Spectrametrix DCP Emission Spectrometry
- Dionex 100 Ion Chromatography
- X-ray Diffraction and Reflectivity (9 instruments)
- UV-Visible Spectroscopy
- Nanoparticle Characterization Equipment (Malvern Mastersizer & Zetasizer Nanosizers, Brookhaven ZetaPALS & Zeta Plus Analyzers, Liquid Surface Tensiometer, Helium Pycnometry)
- Thermal Analysis (TGA Mass Spectrometry, BET ASAP 2020 Surface Area and Porosimetry)
- Dielectric Property Electrical Measurements (3 automated electrical test systems for DC to RF)
- Nanomechanical and Thermal Property Measurements (up to 1600°C in reducing to oxidizing environments)
CNS Resources:
- Lakeshore Cryotonics TTP-4 probe station (to 4K and 3 Tesla vertical magnetic field)
- Quantum Design 6000 Physical Property Measurement System (´2, to 0.45 K and 9 Tesla magnetic field)
- Electrical Characterization Equipment (I-V, lock-in amplifiers, preamplifiers, spectrum analyzers, etc.)
- Nanomechanical Resonance Measurement (controlled ambient to 10-7 Torr)
- Nikon TE2000 Fluorescence Optical Microscopes and Optical Tweezers (´2)
- Interference Photolithography for 2 and 3D submicron patterning of periodic arrays of features
- Visible and Infrared Raman Systems
