PLASMA ETCHING EQUIPMENT
TEGAL 6540 HRE CLUSTER ETCH SYSTEM FOR COMPLEX FERROELECTRIC OXIDE ETCHING
The Tegal 6540 plasma etching system adds significant new strengths, for example the etching of thick PZT, to our growing suite of complex oxide device fabrication systems.
Equipment Configuration
The Tegal 6540 is a high-density plasma etch tool featuring the unique HRe-™ reactor, and Tegal’s patented dual-frequency RF power technology and magnetic plasma confinement. The system is a critical enabler for etching noble metal electrode and capacitor materials, including PZT, as well as other ferroelectric, magnetic, high-K dielectric, compound semiconductor, and interconnect materials.
Available Gases
Cl2, BCl3, SF6, O2, Ar, CF4
Materials Processed
Complex Oxides, Silicon, Aluminum, potentially more, please inquire.
Training
Training - Every Wednesday 9:00 am - 11:00 am
