LITHOGRAPHY EQUIPMENT
GCA 8000 I-LINE STEPPER
Equipment Configuration
- i-Line with Tropel 1635i lens (5x, 0.35NA)
- Resolution
- 0.83µm lines/space in 1µm thick resist
- 0.64µm lines/space with antireflective coatings, thin resist, flat substrate
- Field: 11.3mm x 11.3mm
- Depth of Focus: 1.49µm
- Resolution
- Environmental chamber and atmospheric compensation system
- Global overlay system: ±0.25µm
- Local overlay system: ±0.15µm
- Interchangeable chuck system -- upgrade
- Small parts down to about 1 cm x 1 cm and ~350µm thick (global overlay only)
- 3” SEMI standard wafers
- 100mm SEMI standard wafers
- 150mm SEMI standard wafers
- Chuck Ranges
- Reticles: 5” x 5” quartz (can be exposed in laser writer and e-beam systems)
Details
- Intensity Qualifier (IQ)
- Auto Wafer Handler (currently configured for 3” wafers)
- Maximus 2000 light source (1000W lamps from Ushio)
- PC Upgrade – replaces the original DEC PDP-11
- 6660 Environmental Chamber w/ dedicated HVAC Unit
- 10 Slot Reticle Management System
- UPS
- TMC Isolation Platform – purchased for vibration isolation
- Micro-g table
- SMART SET – metrology system
- DFAS – Dark Field Alignment System
Training
As needed. Please Contact NNIN at Penn State for more information.
