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Penn State
NNIN at Penn State

LITHOGRAPHY EQUIPMENT

RESIST PROCESSING STATIONSResistStation

 

 

Equipment Configuration

 

Etch-Develop-Clean (EDC) Unit and two Spin Processing Units from Laurell Technologies.

 

 

The EDC unit is used for automated developing and will improve throughput and repeatability and reduce developer usage. 

 

The two spin processing units improve the cleanliness and repeatability of our spin casting processes. 

 

ResistBench2

 

The three Laurel units are housed in Reynolds Tech processing stations with laminar air flow. 

 

 

Training

 

Training - Every Wednesday 8:30 am - 12:00 pm