LITHOGRAPHY EQUIPMENT
PHOTOMASK MAKING CAPABILITIES
Photomask needs can be accomplished using the Leica EBPG5 E-beam writer
We have implemented a flat fee on the Leica EBPG5 e-beam tool to generate photomasks. A Flat fee of $350 (academic) and $1067.50 (non-academic) will be charged for masks that can be written overnight. Suitable quartz mask blanks can be purchased from Yan or Chad for an additional fee-$240 (academic) and $366 (non-academic). An additional $100 (academic) or $266.88 (non-academic) will be added if you require staff assistance to complete the entire mask (data processing, loading/unloading, and etching). Please contact Yan Validate to view contact info 814-867-2657 or Chad Validate to view contact info 814-865-8976 to discuss this option.
We can also make reticles for the GCA 8000 and for the MA/BA6 and MJB3.
Future photomask making capabilities will be accomplished with the addition of a GCA/Mann pattern generator.
For immediate photomasks needs, we also recommend using the following external vendors:
For small feature masks from a laser writer and/or pattern generator:
For large feature masks (50 micron and up) from a photo plot system:
