LITHOGRAPHY EQUIPMENT
PHOTOMASK MAKING CAPABILITIES
Photomask needs can be accomplished using the Leica EBPG5 E-beam writer
Please contact Yan Name 814-867-2657 or Chad Name 814-865-8976 to discuss this option or for pricing.
We can also make reticles for the GCA 8000 and for the MA/BA6 and MJB3.
Future photomask making capabilities will be accomplished with the addition of a GCA/Mann pattern generator.
For immediate photomasks needs, we also recommend using the following external vendors:
For small feature masks from a laser writer and/or pattern generator:
For large feature masks (50 micron and up) from a photo plot system:
