CHARACTERIZATION EQUIPMENT
NANOMETRICS 8000X SE
Description
The Nanometrics 8000X SE is an advanced high resolution, fully automated, pattern recognition capable thin film measurement and characterization tool.
The system utilizes a Woollam spectroscopic ellipsometer to extend and complement the capabilities of its reflection spectrophotometer for standard and high-performance applications. These applications include the measurement of both very-thin and multi-layer film stacks, and the characterization of thin-films over a range of 210-800 nm wavelengths.
The ellipsometer uses a Windows-based operating system which is embedded in the NanoSpec 8000 OS/2 WARP operating system for a simple, common interface. The system enables high-speed, multi-spectral analysis, at an acquisition time of less than 1 millisecond per wavelength.
Equipment Configuration
- Multi wafer size handling (75,100,125,150,200 mm capable), cassette to cassette handling
- Spectrophotometer head specifications: dual light sources providing 210-800 nm wavelength range (UV capability for measuring very thin film); multi objective head (4x, 10x,15x,and 40x) providing measurement area range from 6.25 µm to 62.5 µm
- Ability to measure absolute and relative reflectance
- Library of standard and customizable film programs
- Two and three dimensional wafer mapping software
- Statistical Process Control (SPC) Software
- Pattern recognition software
- Automated lens turret and autofocus
- Database storage for measurements
- Color video imaging
- Built in automatic reference
Training
Training - Every Tuesday 1:00 pm - 2:00 pm
