CHARACTERIZATION EQUIPMENT
NANOMETRICS 8000X SE
Description
The Nanometrics 8000X SE is an advanced high resolution, fully automated, pattern recognition capable thin film measurement and characterization tool.
The system utilizes a Woollam spectroscopic ellipsometer to extend and complement the capabilities of its reflection spectrophotometer for standard and high-performance applications. These applications include the measurement of both very-thin and multi-layer film stacks, and the characterization of thin-films over a range of 210-800 nm wavelengths.
The ellipsometer uses a Windows-based operating system which is embedded in the NanoSpec 8000 OS/2 WARP operating system for a simple, common interface. The system enables high-speed, multi-spectral analysis, at an acquisition time of less than 1 millisecond per wavelength.
Equipment Configuration
- Multi wafer size handling (75,100,125,150,200 mm capable), cassette to cassette handling
- Spectrophotometer head specifications: dual light sources providing 210-800 nm wavelength range (UV capability for measuring very thin film); multi objective head (4x, 10x,15x,and 40x) providing measurement area range from 6.25 µm to 62.5 µm
- Ability to measure absolute and relative reflectance
- Library of standard and customizable film programs
- Two and three dimensional wafer mapping software
- Statistical Process Control (SPC) Software
- Pattern recognition software
- Automated lens turret and autofocus
- Database storage for measurements
- Color video imaging
- Built in automatic reference
Training
Training demos will be held every Tuesday afternoon from 1-2 pm beginning Tuesday, October 6 through Tuesday, November 24, 2009.
The training demos will be no charge, however, all users must have an established user profile and billing account and must be safety trained before entering the cleanroom (see Getting Started).
To schedule a training demo, please contact NNIN at Penn State.
