LITHOGRAPHY EQUIPMENT
KARL SUSS MJB3 CONTACT ALIGNER
Equipment Configuration
- Completely manually operated
- Single objective optical microscope
- Maximum of 3 inch wafer size
- Mixed exposure wavelength of 365/405 nm
- Top side optical alignment
- Infrared backside alignment
- Handles mask size of 4 inches
- Ultraviolet (UV) exposure at 365 nm, 405 nm
- Vacuum, hard, and soft contact modes available
Available Resists
S1805, S1813, S1827, SPR3012, SPR220
Liftoff: LOR1A, LOR2A, LOR20B
Training
Training - Every Thursday 9:00 am - 10:30 am
