LITHOGRAPHY EQUIPMENT
KARL SUSS MA/BA6 CONTACT ALIGNER WITH BACKSIDE ALIGNMENT
Equipment Configuration
- Can handle sample and wafer sizes from small parts to 150 nm
- Backside alignment on 4" & 150 mm wafers
- Mask holders available: 7"x7", 5"x5", 4"x4"
- Mixed exposure wavelength of 365/405 nm
- Soft contact, hard contact, vacuum contact, and proximity modes available
- Split field microscope
Available Resists
S1805, S1813, S1827, SPR3012, SPR220
Liftoff: LOR1A, LOR2A, LOR20B
Typical Exposure Recipes - Coming Soon
Training
Training - Every Wednesday 9:00 am - 12:00 pm
