CHEMICAL NANOFABRICATION & CHARACTERIZATION EQUIPMENT
MOLECULAR IMPRINTS IMPRIO 55 NANOIMPRINTER
Equipment Configuration
The Molecular Imprints Imprio 55 is a nano-imprint lithography tool with proven resolution down to 30nm. It is capable of much smaller features and is limited by the feature sizes defined on the quartz master mold. The master mold or template is fabricated by a process similar to that used to make industry standard phase shift masks. The Imprio 55 employs Step-and-Flash technology where a liquid monimer is dispensed just before imprint. The monimer is crosslinked with UV light and the process repeats. This process is often called an "e-beam amplifier" because it takes only one slow electron beam lithography process to make the template, then the template is accurately reproduced in just a few minutes in the Imprio 55 leading to a rapid method to reproduce features over large areas.
Template fabrication is offered at Penn State using our in-house developed process.
Training
As needed. Please Contact NNIN at Penn State for more information.
