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Penn State
NNIN at Penn State

LITHOGRAPHY EQUIPMENT

LEICA EBPG5-HR E-BEAM WRITEREbeam

 

 

Equipment Configuration

 

The Leica EBPG-5R is a system designed for high resolution fabrication and placement of patterns written directly on substrates. The system is also very capable of writing optical masks for contact and projection lithography.

 

 

 

Details

 

Resists in stock:

 

 

Resolution:

 

 

Stitch and Overlay:

 

 

Programmable Scan Fields:

 

 

 

Training

 

As needed. Please Contact NNIN at Penn State for more information.