LITHOGRAPHY EQUIPMENT
OAI DEEP UV FLOOD EXPOSURE
Equipment Configuration
The OAI stand-alone UV light source system consists of the following:
- stand-alone light source
- constant intensity controller
- shutter controller
The Model 30 LS is a highly efficient light source intended for a variety of applications; curing and stabilizing resists to withstand aggressive implant and etch conditions, or used as a collimated light for high resolution bi-layer resist stacks used for lift-off of metals with DUV sensitive materials.
The light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source can accommodate up to a 200 mm wafer and an output near 245 nm.
The intensity controller controls the light source intensity to a user-desired level and keeps it constant over the lifetime of the lamp. The intensity controller features a display for monitoring lamp intensity and power. An audible alarm alerts the operator when to change lamp. The shutter timer activates the light source shutter. The timer range is from 0.1 to 999 seconds.
