THIN FILM DEPOSITION EQUIPMENT
APPLIED MATERIALS P-5000 PECVD CLUSTER TOOL
Equipment Configuration
The Applied Materials P-5000 is a four Chamber cluster tool capable of handling small pieces through 8” wafers. The system can be run in either manual or automatic mode depending on the number of samples being run. The configuration of the chambers on the system is:
- Chamber A:
- Liquid Precursor Delivery
- Chamber B:
- Oxide, Nitride and Oxy-Nitride Deposition
- Chamber C:
- Configured for MERIE of Dielectric Materials
- Chamber D:
- Configured for undoped amorphous silicon deposition with dual frequency RF power supplies. (350kHz and 13.65 MHz) Capability to provide both P and N type amorphous Si films will be available in the future.
Available Gases
- Chamber A: Configured for Liquid Precursor Delivery
- Chamber B: Configured for Oxide, Nitride and Oxy-Nitride Deposition
- SiH4, NH3, N2O, Ar, H2, and N2
- Chamber C: Configured for MERIE of Dielectric Materials
- CHF3, CF4, C2F6, O2, Ar, N2
- Chamber D:
- SiH4, N2, N2O, Ar, H2, and He
- Future availability: CF4, PH3, BF3 and B(CH3)3
Training
Training - Every Monday 1:30 pm - 4:30 pm
