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Penn State
Materials Research Institute

X-Ray Photoelectron Spectroscopy (XPS/ESCA)

Description

Soft x-rays (<1.5 keV) ionize atoms in a solid producing photoelectrons from core shells (the photoelectric effect). The kinetic energy of the emitted electron is equal to the x-ray energy less the energy that the electron is bound to the atom (K.E. = hν - B.E.). The low kinetic energy (by definition < 1.5 keV) makes the technique inherently surface sensitive with the majority of the photoelectrons in a given sample originating from the outer 5 nm. The number of electrons detected is proportional to the concentration in the sample. Perhaps most importantly, the exact binding energy is a function of the local environment of the atom yielding a chemical (or oxidation) state sensitive tool.

 

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Technique Advantages

 

Typical Applications

 

Organic Coatings and Films

  • surface functionality
  • surface modification
  • molecular orientation
  • adhesion studies
  • surface segregation
  • failure analysis
  • metallized layers

 

Ceramics, Glasses & Minerals

  • composition and thickness of optical coatings
  • fiberglass coatings
  • powder surface chemistry
  • mineral weathering
  • layer thickness and composition
  • organic coatings
  • impurity determination
  • bridging vs. non-bridging oxygen

Semiconductors

  • film stoichiometry
  • layer thickness
  • etch residues
  • low energy ion implant characterization
  • surface contaminants
  • reverse engineering
  • gate dielectrics

 

Metallurgy

  • diffusion studies
  • surface segregation
  • interface formation
  • corrosion and oxidation studies
  • surface contaminants

 

Catalysts

  • zeolite composition
  • catalyst poisoning
  • oxidation state determination

 

Download application notes: XPS and HR-TEM Analysis of High k Thin Films

 

Sample Requirements

 

Other Information