FALL 2007 MCL SHORT COURSE DETAILS
High Resolution X-ray Scattering Methods for Thin Film Materials Analysis
Friday, August 17, 2007 from 9:00 a.m. to 4:30 p.m.
Room 204, The Penn Stater Conference Center Hotel, Innovation Park
Per Person Cost: Student $80; Other Academic $150; Industry $200
To Register: Click here for registration form (deadline is August 10, 2007)
Questions to be Addressed
- What are the key concepts in
X-ray scattering theory as they apply to the analysis of thin film materials?
- What are the differences between various high resolution X-ray scattering methods, and how are these analyses performed?
- What information can be gained from high resolution X-ray diffractometry and X-ray reflectometry analyses from various thin film materials, and which method is most suited for
a particular material or analytical problem?
- What are the strengths and limitations of high resolution
X-ray methods for materials analysis?
Course Description
High resolution X-ray scattering is becoming increasingly important for the characterization of thin film materials and structures, particularly for the analysis of parameters such as crystalline perfection, layer thickness, chemical composition, strain and strain relaxation, and interfacial roughness. This short course will discuss some basic principles of high resolution X-ray scattering methods (notably double-axis and triple-axis X-ray diffractometry as well as high resolution X-ray reflectometry); it will present the theory that underpins their operation, describe experimental procedures used for data collection, and discuss strategies for data analysis. Extensive reference will be made to “real-life” problems involving a variety of thin-film structures (ranging from amorphous dielectrics and polycrystalline metals to highly perfect epitaxial single crystal materials) in order to show both the utility and the shortcomings of high resolution X-ray methods in materials characterization.
Instructor
Richard J. Matyi received his degrees in Materials Science and Engineering from Northwestern University (B.S., 1975; Ph.D., 1983) and M.I.T. (S.M., 1976). His research career has spanned industry (Texas Instruments, Inc.), the U.S. government (National Institute of Standards and Technology) and academia (University of Wisconsin – Madison and the State University of New York at Albany). He is currently a Professor in the College of Nanoscale Science and Engineering at SUNY – Albany, where his research centers on the fabrication and processing of nanostructured materials and their analysis with X-ray probes, particularly high resolution X-ray diffractometry and reflectometry. Dr. Matyi is author or co-author on over 150 scientific publications and holds three patents; he is currently preparing the book High Resolution X-Ray Scattering Methods for Materials Analysis for Cambridge University Press.
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For Out-of-Town Attendees: Please refer to the online Penn State Visitors Guide for maps, directions, and local hotel information. If you have questions about visiting the campus, please contact Elaine Sanders in the MCL Administrative Office at 814-865-2328.

